Interband tunneling for hole injection in III-nitride ultraviolet emitters

Type: Article

Publication Date: 2015-04-06

Citations: 83

DOI: https://doi.org/10.1063/1.4917529

Abstract

Ultra-violet emitters have several applications in the areas of sensing, water purification, and data storage. While the III-Nitride semiconductor system has the band gap region necessary for ultraviolet emission, achieving efficient ultraviolet solid state emitters remains a challenge due to the low p-type conductivity and high contact resistance in wide band gap AlGaN-based ultra-violet light emitters. In this work, we show that efficient interband tunneling can be used for non-equilibrium injection of holes into ultraviolet emitters. Polarization-engineered tunnel junctions were used to enhance tunneling probability by several orders of magnitude over a PN homojunction, leading to highly efficient tunnel injection of holes to ultraviolet light emitters. This demonstration of efficient interband tunneling introduces a new paradigm for design of ultra-violet light emitting diodes and diode lasers, and enables higher efficiency and lower cost ultra-violet emitters.

Locations

  • Applied Physics Letters - View - PDF
  • arXiv (Cornell University) - View - PDF
  • OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information) - View
  • DataCite API - View

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