Type: Article
Publication Date: 2011-12-26
Citations: 34
DOI: https://doi.org/10.1063/1.3672000
We developed transmon qubits based on epitaxial tunnel junctions and interdigitated capacitors. This multileveled qubit, patterned by use of all-optical lithography, is a step towards scalable qubits with a high integration density. The relaxation time T1 is 0.72−0.86 μs and the ensemble dephasing time T2* is slightly larger than T1. The dephasing time T2 (1.36 μs) is nearly energy-relaxation-limited. Qubit spectroscopy yields weaker level splitting than observed in qubits with amorphous barriers in equivalent-size junctions. The qubit’s inferred microwave loss closely matches the weighted losses of the individual elements (junction, wiring dielectric, and interdigitated capacitor), determined by independent resonator measurements.