Data-driven surrogate model for etch rate profiles using sensor data
from a reactive ion etcher
Data-driven surrogate model for etch rate profiles using sensor data
from a reactive ion etcher
Reliable predictions of the etch rate profile are desirable in semiconductor manufacturing to prevent etch rate target misses and yield rate excursions. Conventional methods for analyzing etch rate require extensive metrology, which adds considerable costs to manufacturing. We demonstrate a data-driven method to predict the etch rate profiles of a …