CAMO: Correlation-Aware Mask Optimization with Modulated Reinforcement
Learning
CAMO: Correlation-Aware Mask Optimization with Modulated Reinforcement
Learning
Optical proximity correction (OPC) is a vital step to ensure printability in modern VLSI manufacturing. Various OPC approaches based on machine learning have been proposed to pursue performance and efficiency, which are typically data-driven and hardly involve any particular considerations of the OPC problem, leading to potential performance or efficiency …