Physics-Informed Optical Kernel Regression Using Complex-valued Neural Fields
Physics-Informed Optical Kernel Regression Using Complex-valued Neural Fields
Lithography is fundamental to integrated circuit fabrication, necessitating large computation overhead. The advancement of machine learning (ML)-based lithography models alleviates the trade-offs between manufacturing process expense and capability. However, all previous methods regard the lithography system as an image-to-image black box mapping, utilizing network parameters to learn by rote mappings …