DevelSet: Deep Neural Level Set for Instant Mask Optimization
DevelSet: Deep Neural Level Set for Instant Mask Optimization
As one of the key techniques for resolution enhancement technologies (RETs), optical proximity correction (OPC) suffers from prohibitive computational costs as feature sizes continue to shrink. Inverse lithography techniques (ILTs) treat the mask optimization process as an inverse imaging problem, yielding high-quality curvilinear masks. However, ILT methods often fall short …