Chlorine doping of MoSe<sub>2</sub> flakes by ion implantation
Chlorine doping of MoSe<sub>2</sub> flakes by ion implantation
The efficient integration of transition metal dichalcogenides (TMDs) into the current electronic device technology requires mastering the techniques of effective tuning of their optoelectronic properties. Specifically, controllable doping is essential. For conventional bulk semiconductors, ion implantation is the most developed method offering stable and tunable doping. In this work, we …