Microwave Properties of Superconducting Atomic-Layer Deposited TiN Films
Microwave Properties of Superconducting Atomic-Layer Deposited TiN Films
We have grown superconducting TiN films by atomic layer deposition with thicknesses ranging from 6 to 89 nm. This deposition method allows us to tune the resistivity and critical temperature by controlling the film thickness. The microwave properties are measured, using a coplanar-waveguide resonator, and we find internal quality factors …