Characterization of sputtered hafnium thin films for high quality factor microwave kinetic inductance detectors
Characterization of sputtered hafnium thin films for high quality factor microwave kinetic inductance detectors
Hafnium is an elemental superconductor which crystallizes in a hexagonal close packed structure, has a transition temperature $T_{C} \simeq 400 mK$, and has a high normal state resistivity around $90 \mu \Omega. cm$. In Microwave Kinetic Inductance Detectors (MKIDs), these properties are advantageous since they allow for creating detectors sensitive …