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Fabrication of $\hbox{Nb/Al}_{2}\hbox{O}_{3}/\hbox{Nb}$ Josephson Junctions Using In Situ Magnetron Sputtering and Atomic Layer Deposition
Atomic layer deposition (ALD) provides a promising approach for deposition of ultrathin low-defect-density tunnel barriers, and it has been implemented in a high-vacuum magnetron sputtering system for in situ deposition of ALD-Al2O3 tunnel barriers in superconductor-insulator-superconductor (SIS) Josephson junctions. A smooth ALD-Al2O3 barrier layer was grown on a Al-wetted Nb …