Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit
Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit
Classical optical lithography is diffraction limited to writing features of a size lambda/2 or greater, where lambda is the optical wavelength. Using nonclassical photon-number states, entangled N at a time, we show that it is possible to write features of minimum size lambda/(2N) in an N-photon absorbing substrate. This result …