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Thermostable trilayer resist for niobium lift-off

Thermostable trilayer resist for niobium lift-off

We have developed a novel lift-off process for fabrication of high quality superconducting submicron niobium structures. The process makes use of a thermostable polymer with a high transition temperature Tg=235 °C and an excellent chemical stability. The superconducting critical temperature of 150-nm-wide niobium lines is above 7 K. An example …